Skip to main content

Illustration Photolithography - steps

<span>Photolithography - steps</span>

Share โ€” copy and redistribute the material in any medium or format

Adapt โ€” remix, transform, and build upon the material for any purpose, even commercially.

Sharing and adapting of the illustration is allowed with indication of the link to the illustration.

Photolithography is used to produce integrated circuits that can be found in almost every technology. A conductive layer is applied to a substrate (base material) (e.g. by MBE process). A photoresist (also called photoresist) is then glued onto it.

A mask containing the circuit structure is then placed as close as possible to the photoresist and then illuminated with light, electron radiation or X-rays. The illuminated areas are then removed along with the etch. The remaining photoresist is removed. The circuit is finished.