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Photolithography is used to produce integrated circuits that can be found in almost every technology. A conductive layer is applied to a substrate (base material) (e.g. by MBE process). A photoresist (also called photoresist) is then glued onto it.
A mask containing the circuit structure is then placed as close as possible to the photoresist and then illuminated with light, electron radiation or X-rays. The illuminated areas are then removed along with the etch. The remaining photoresist is removed. The circuit is finished.