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Illustration Metal Organic Chemical Vapor Deposition (MOCVD)

Metal Organic Chemical Vapor Deposition (MOCVD)
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With the help of Metal Organic Chemical Vapor Deposition (MOCVD), semiconductor heterostructures, such as those made of GaAs, can be fabricated. Elements bound to the carrier gas (here Ga and As) are blown laminarly into the reaction chamber. These react on the surface of the heated substrate and form a semiconductor layer. Residual gases are removed from the reaction chamber using a pump.